DocumentCode :
2387652
Title :
Stable flow gas delivery system for low pressure liquefied gases
Author :
Takagi, Hideki ; Ino, Minoru ; Tabata, Masahiro ; Nishikawa, Yukinobu
Author_Institution :
Electron. Bus. Dev. Div., AIR LIQUIDE Japan Ltd., Ibaraki, Japan
fYear :
2000
fDate :
2000
Firstpage :
387
Lastpage :
390
Abstract :
This paper describes the possibility to supply the low vapor pressure liquefied gas at stable pressure and relatively high flow rate by a system called all vapor phase gas delivery system, together with evaluation test results using WF6 and BCl3
Keywords :
flowmeters; semiconductor device manufacture; BCl3; WF6; evaluation test results; low pressure liquefied gases; process gases; relatively high flow rate; semiconductor manufacture; stable flow gas delivery system; vapor phase gas delivery system; Control systems; Gas detectors; Gases; Heating; Pressure control; Sensor systems; System testing; Temperature control; Thermal sensors; Weight control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
0-7803-7392-8
Type :
conf
DOI :
10.1109/ISSM.2000.993694
Filename :
993694
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2387652
بازگشت