• DocumentCode
    2387948
  • Title

    Process optimization and interface cotrol in chemical vapor deposition of high dielectric constant thin films

  • Author

    Gao, Y. ; Perkins, C.L. ; Henderson, M.A. ; Rogers, J.W., Jr.

  • Author_Institution
    Interfacial and Processing Sciences, Pacific Northwest National Laboratory
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    457
  • Lastpage
    459
  • Keywords
    Binary search trees; Chemical vapor deposition; Chemistry; Dielectric materials; Dielectric thin films; High-K gate dielectrics; Semiconductor films; Sputtering; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993712
  • Filename
    993712
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2387948