DocumentCode :
2387948
Title :
Process optimization and interface cotrol in chemical vapor deposition of high dielectric constant thin films
Author :
Gao, Y. ; Perkins, C.L. ; Henderson, M.A. ; Rogers, J.W., Jr.
Author_Institution :
Interfacial and Processing Sciences, Pacific Northwest National Laboratory
fYear :
2000
fDate :
2000
Firstpage :
457
Lastpage :
459
Keywords :
Binary search trees; Chemical vapor deposition; Chemistry; Dielectric materials; Dielectric thin films; High-K gate dielectrics; Semiconductor films; Sputtering; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
ISSN :
1523-553X
Print_ISBN :
0-7803-7392-8
Type :
conf
DOI :
10.1109/ISSM.2000.993712
Filename :
993712
Link To Document :
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