Title :
AMd´s Fab 30 Dresden, Germany
Author_Institution :
AMD Saxony Manufacturing GmbH Advanced Micro Devices, Inc.
Keywords :
Contamination; Copper; Design engineering; Dielectrics; Etching; Lead compounds; Microprocessors; Product design; Semiconductor device manufacture; Virtual manufacturing;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993713
