• DocumentCode
    2388390
  • Title

    Bias Dependence of Partially-Depleted SOI Transistor to Total Dose Irradiation

  • Author

    Wang, Yingmin ; Wang, Xiaohe ; Zhao, Guiru ; En, Yunfei ; Luo, Hongwei ; Shi, Qian ; Zhang, Xiaowen

  • Author_Institution
    771st Res. Inst. of China Electron. Technol. Group Corp., Xi´´an
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    233
  • Lastpage
    235
  • Abstract
    Through experimental results and analysis by MEDICI simulations, different irradiation response for partially depleted (PD) silicon-on-insulator (SOI) transistors was investigated. The worst-case bias for PD SOI NMOSFETs during total dose irradiation were obtained by irradiated the transistors under different bias. The results of simulation with MEDICI showed that the response of the transistors to total dose radiation strongly depended on the electrical field in the buried oxide layer of the SOI transistors, and the worst electric field bias case for SOI NMOSFETs with total dose radiation was suggested. Good agreement between experimental results and simulation is demonstrated
  • Keywords
    MOSFET; radiation hardening (electronics); silicon-on-insulator; MEDICI simulations; Si; bias dependence; buried oxide layer; partially depleted SOI NMOSFETs; silicon-on-insulator transistors; total dose radiation; Content addressable storage; Information technology; MOS devices; MOSFETs; Medical simulation; Reliability engineering; Semiconductor films; Silicon on insulator technology; Substrates; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology, 2006. IWJT '06. International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0047-3
  • Type

    conf

  • DOI
    10.1109/IWJT.2006.220899
  • Filename
    1669486