DocumentCode
2388390
Title
Bias Dependence of Partially-Depleted SOI Transistor to Total Dose Irradiation
Author
Wang, Yingmin ; Wang, Xiaohe ; Zhao, Guiru ; En, Yunfei ; Luo, Hongwei ; Shi, Qian ; Zhang, Xiaowen
Author_Institution
771st Res. Inst. of China Electron. Technol. Group Corp., Xi´´an
fYear
0
fDate
0-0 0
Firstpage
233
Lastpage
235
Abstract
Through experimental results and analysis by MEDICI simulations, different irradiation response for partially depleted (PD) silicon-on-insulator (SOI) transistors was investigated. The worst-case bias for PD SOI NMOSFETs during total dose irradiation were obtained by irradiated the transistors under different bias. The results of simulation with MEDICI showed that the response of the transistors to total dose radiation strongly depended on the electrical field in the buried oxide layer of the SOI transistors, and the worst electric field bias case for SOI NMOSFETs with total dose radiation was suggested. Good agreement between experimental results and simulation is demonstrated
Keywords
MOSFET; radiation hardening (electronics); silicon-on-insulator; MEDICI simulations; Si; bias dependence; buried oxide layer; partially depleted SOI NMOSFETs; silicon-on-insulator transistors; total dose radiation; Content addressable storage; Information technology; MOS devices; MOSFETs; Medical simulation; Reliability engineering; Semiconductor films; Silicon on insulator technology; Substrates; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology, 2006. IWJT '06. International Workshop on
Conference_Location
Shanghai
Print_ISBN
1-4244-0047-3
Type
conf
DOI
10.1109/IWJT.2006.220899
Filename
1669486
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