DocumentCode :
2388697
Title :
Fabrication and Performance of GaAs Double Camel-Like Gate FET with Extremely High Gate Turn-on Voltage
Author :
Tsai, Jung-Hui ; Kang, Yu-Chi ; Weng, Tzu-Yen ; Hsu, I-Hsuan
Author_Institution :
Dept. of Phys., Nat. Kaohsiung Inst. of Technol.
fYear :
0
fDate :
0-0 0
Firstpage :
287
Lastpage :
290
Abstract :
Extremely high potential barrier height and gate turn-on voltage of a novel GaAs field-effect transistor with n+/p+/n+/p+/n double camel-like gate structure are demonstrated. The maximum electric field and potential barrier height of the double camel-like gate are substantially enhanced by the addition of another n+/p+ layers in gate region, as compared with the conventional n+ /p+/n single camel-like gate. For a 1 times 100 mum 2 device, a potential barrier height up to 2.741 V is obtained. Experimentally, a high gate turn-on voltage up to + 4.9 V is achieved because two reverse-biased junctions of the double camel-like gate absorb part of positive gate voltage. In addition, the transistor action shows a maximum saturation current of 730 mA/mm and an extrinsic transconductance of 166 mS/mm
Keywords :
III-V semiconductors; field effect transistors; gallium arsenide; 4.9 V; GaAs; double camel-like gate FET; electric field; field-effect transistor; gate turn-on voltage; high potential barrier height; reverse-biased junctions; saturation current; transconductance; Double-gate FETs; Electric potential; Electrodes; Fabrication; Gallium arsenide; Inverters; MODFET circuits; Ohmic contacts; Physics; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology, 2006. IWJT '06. International Workshop on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0047-3
Type :
conf
DOI :
10.1109/IWJT.2006.220913
Filename :
1669500
Link To Document :
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