• DocumentCode
    2388697
  • Title

    Fabrication and Performance of GaAs Double Camel-Like Gate FET with Extremely High Gate Turn-on Voltage

  • Author

    Tsai, Jung-Hui ; Kang, Yu-Chi ; Weng, Tzu-Yen ; Hsu, I-Hsuan

  • Author_Institution
    Dept. of Phys., Nat. Kaohsiung Inst. of Technol.
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    287
  • Lastpage
    290
  • Abstract
    Extremely high potential barrier height and gate turn-on voltage of a novel GaAs field-effect transistor with n+/p+/n+/p+/n double camel-like gate structure are demonstrated. The maximum electric field and potential barrier height of the double camel-like gate are substantially enhanced by the addition of another n+/p+ layers in gate region, as compared with the conventional n+ /p+/n single camel-like gate. For a 1 times 100 mum 2 device, a potential barrier height up to 2.741 V is obtained. Experimentally, a high gate turn-on voltage up to + 4.9 V is achieved because two reverse-biased junctions of the double camel-like gate absorb part of positive gate voltage. In addition, the transistor action shows a maximum saturation current of 730 mA/mm and an extrinsic transconductance of 166 mS/mm
  • Keywords
    III-V semiconductors; field effect transistors; gallium arsenide; 4.9 V; GaAs; double camel-like gate FET; electric field; field-effect transistor; gate turn-on voltage; high potential barrier height; reverse-biased junctions; saturation current; transconductance; Double-gate FETs; Electric potential; Electrodes; Fabrication; Gallium arsenide; Inverters; MODFET circuits; Ohmic contacts; Physics; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology, 2006. IWJT '06. International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0047-3
  • Type

    conf

  • DOI
    10.1109/IWJT.2006.220913
  • Filename
    1669500