• DocumentCode
    2390109
  • Title

    2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580)

  • fYear
    2001
  • fDate
    15-18 Oct. 2001
  • Abstract
    The following topics are dealt with: microelectronic reliability; semiconductor reliability; customer product reliability requirements; contributors to failure; wafer-level reliability; gate oxide reliability; burn-in; electromigration
  • Keywords
    reliability; burn-in; electromigration; gate oxide reliability; microelectronic reliability; semiconductor reliability; wafer-level reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2001. 2001 IEEE International
  • Conference_Location
    Lake Tahoe, CA, USA
  • Print_ISBN
    0-7803-7167-4
  • Type

    conf

  • DOI
    10.1109/IRWS.2001.993907
  • Filename
    993907