• DocumentCode
    2390494
  • Title

    Implementation of FWLR for process reliability monitoring

  • Author

    Yap, K.L. ; Yap, H.K. ; Tan, Y.C. ; Lo, K.F. ; Karim, M.F. ; Manna, I.

  • Author_Institution
    QRA Reliability Eng. Sect., Chartered Semicond. Manuf. Ltd, Singapore, Singapore
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    94
  • Lastpage
    96
  • Abstract
    In Chartered, process reliability monitoring (PRM) begins after a new technology is qualified, aims at ensuring specific reliability goals are met and detecting reliability degradation due to process drift/changes and in-line issues. PRM data is provided to customer on a regular basis. Traditional PRM programs (package level stress) are expensive and time consuming, while very short test time of FWLR (Fast Wafer Level Reliability) offers a practical technique of providing quick intrinsic reliability information to process engineers. FWLR is defined as highly accelerated stress, specific to a particular failure mechanism, to measure rate of degradation of material. When correlation with traditional more moderate stress is established, FWLR can also be used for lifetime extrapolation purpose. This paper describes the implementation of FWLR to monitor intrinsic process reliability performance
  • Keywords
    process monitoring; reliability; fast wafer level reliability; process reliability monitoring; Acceleration; Degradation; Failure analysis; Monitoring; Packaging; Particle measurements; Reliability engineering; Stress measurement; Testing; Wafer scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2001. 2001 IEEE International
  • Conference_Location
    Lake Tahoe, CA
  • Print_ISBN
    0-7803-7167-4
  • Type

    conf

  • DOI
    10.1109/.2001.993927
  • Filename
    993927