DocumentCode
2390494
Title
Implementation of FWLR for process reliability monitoring
Author
Yap, K.L. ; Yap, H.K. ; Tan, Y.C. ; Lo, K.F. ; Karim, M.F. ; Manna, I.
Author_Institution
QRA Reliability Eng. Sect., Chartered Semicond. Manuf. Ltd, Singapore, Singapore
fYear
2001
fDate
2001
Firstpage
94
Lastpage
96
Abstract
In Chartered, process reliability monitoring (PRM) begins after a new technology is qualified, aims at ensuring specific reliability goals are met and detecting reliability degradation due to process drift/changes and in-line issues. PRM data is provided to customer on a regular basis. Traditional PRM programs (package level stress) are expensive and time consuming, while very short test time of FWLR (Fast Wafer Level Reliability) offers a practical technique of providing quick intrinsic reliability information to process engineers. FWLR is defined as highly accelerated stress, specific to a particular failure mechanism, to measure rate of degradation of material. When correlation with traditional more moderate stress is established, FWLR can also be used for lifetime extrapolation purpose. This paper describes the implementation of FWLR to monitor intrinsic process reliability performance
Keywords
process monitoring; reliability; fast wafer level reliability; process reliability monitoring; Acceleration; Degradation; Failure analysis; Monitoring; Packaging; Particle measurements; Reliability engineering; Stress measurement; Testing; Wafer scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2001. 2001 IEEE International
Conference_Location
Lake Tahoe, CA
Print_ISBN
0-7803-7167-4
Type
conf
DOI
10.1109/.2001.993927
Filename
993927
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