Title :
Process Technology - Advanced Gatestack and Dielectrics
Keywords :
Costs; Hafnium; High-K gate dielectrics; MIM capacitors; Nonvolatile memory; Random access memory; SONOS devices; Silicon compounds; Tin;
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0438-X
DOI :
10.1109/IEDM.2006.347004
