Title :
The performance and reliability enhancement of ETOX p-channel flash EEPROM cell with p-doped floating-gate
Author :
Tsai, H.W. ; Chiang, Patrick Yin ; Chung, S.S. ; Kuo, D.S. ; Liang, M.S.
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
In this paper, we proposed a simple approach for designing reliable and high performance p-channel Flash EEPROM cell from the floating-gate engineering point of view. In other words, a p-type doped floating gate used in a p-channel flash cell can achieve this goal. Results show that the programming speed, gate/drain disturb, read lifetime, and data retention in p-type floating-gate cell are much better than those of n-type floating-gate cell; except that p-type floating-gate cell has slower erasing speed. These results can be used as a guideline for designers to choose.
Keywords :
flash memories; integrated circuit reliability; n-type floating-gate cell; p-channel flash EEPROM cell; p-doped floating-gate; reliability; Design engineering; Dielectrics; Doping; EPROM; Flash memory; Flash memory cells; Nonvolatile memory; Reliability engineering; Testing; Voltage;
Conference_Titel :
VLSI Technology, Systems, and Applications, 2003 International Symposium on
Print_ISBN :
0-7803-7765-6
DOI :
10.1109/VTSA.2003.1252545