• DocumentCode
    2394642
  • Title

    Depth resolved wide field illumination for biomedical imaging and fabrication

  • Author

    So, Peter T.C. ; Kim, Daekeun

  • Author_Institution
    Dept. of Mech. Eng., Massachusetts Inst. of Technol., Cambridge, MA, USA
  • fYear
    2009
  • fDate
    3-6 Sept. 2009
  • Firstpage
    3234
  • Lastpage
    3235
  • Abstract
    Nonlinear microscopic imaging is relatively slow due to the sequential nature of raster scanning. Recently, this limitation was overcome by developing a 3D-resolved wide-field two-photon microscope based on the concept of temporal focusing. The existing temporal focusing systems have poor optical sectioning capability and, due to a shortage of illumination power, low actual frame rate. In this presentation, a comprehensive mathematical model for temporal focusing two-photon microscope will be presented. By optimizing instrument design and the use of high two-photon cross section quantum dots, we demonstrate single quantum dot imaging with submicron resolution at video rate and applied it to study transport processes in cells. Further, we realize that the depth resolved wide field illumination can be used for microfabrication. A prototype three-dimensional lithographic microfabrication system was developed and micropatterning capability based on photobleaching process is demonstrated.
  • Keywords
    biomedical optical imaging; lighting; optical microscopy; optimisation; quantum dots; biomedical fabrication; biomedical imaging; depth resolved wide field illumination; illumination power; instrument design optimization; nonlinear microscopic imaging; raster scanning; temporal focusing; two photon cross section quantum dots; Cell Membrane; Equipment Design; Humans; Imaging, Three-Dimensional; Light; Lighting; Microscopy; Nanotechnology; Neoplasms; Photons; Quantum Dots; Time Factors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Engineering in Medicine and Biology Society, 2009. EMBC 2009. Annual International Conference of the IEEE
  • Conference_Location
    Minneapolis, MN
  • ISSN
    1557-170X
  • Print_ISBN
    978-1-4244-3296-7
  • Electronic_ISBN
    1557-170X
  • Type

    conf

  • DOI
    10.1109/IEMBS.2009.5333601
  • Filename
    5333601