DocumentCode
2395014
Title
Surface Flashover of Silicon
Author
Peterkin, F.E. ; Williams, P.F. ; Ridolfi, T. ; Hankla, B.J. ; Buresh, L.L.
Author_Institution
University of Nebraska-Lincoln
fYear
1991
fDate
16-19 June 1991
Firstpage
118
Lastpage
121
Abstract
We have previously reported the results of experiments based on high-speed shutter and streak photography which show clearly that in surface flashover of silicon in a vacuum ambient the current flows primarily in the silicon, not in the ambient. Here we present scanning electron microscope (SEM) photographs of the surface damage resulting from flashover which show that this current is filamentary. Photomicrographs obtained from samples with diffused p/sup +/ and n/sup +/ contacts show that the contacts exert a strong influence over the flashover characteristics. Finally, we report the results of experiments in which the sample was illuminated with a weak pulse of visible light either before or just after the application of the voltage pulse to the sample. These experiments show that flashover can be inhibited by such a light pulse, and shed light on the relationship between the flashover mechanism and electric field inhomogeneities.
Keywords
Breakdown voltage; Copper; Electric breakdown; Electrodes; Flashover; Plasma applications; Scanning electron microscopy; Semiconductor device breakdown; Silicon; Vacuum breakdown;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Conference, 1991. Digest of Technical Papers. Eighth IEEE International
Conference_Location
San Diego, CA, USA
Print_ISBN
0-7803-0177-3
Type
conf
DOI
10.1109/PPC.1991.733247
Filename
733247
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