DocumentCode :
2395014
Title :
Surface Flashover of Silicon
Author :
Peterkin, F.E. ; Williams, P.F. ; Ridolfi, T. ; Hankla, B.J. ; Buresh, L.L.
Author_Institution :
University of Nebraska-Lincoln
fYear :
1991
fDate :
16-19 June 1991
Firstpage :
118
Lastpage :
121
Abstract :
We have previously reported the results of experiments based on high-speed shutter and streak photography which show clearly that in surface flashover of silicon in a vacuum ambient the current flows primarily in the silicon, not in the ambient. Here we present scanning electron microscope (SEM) photographs of the surface damage resulting from flashover which show that this current is filamentary. Photomicrographs obtained from samples with diffused p/sup +/ and n/sup +/ contacts show that the contacts exert a strong influence over the flashover characteristics. Finally, we report the results of experiments in which the sample was illuminated with a weak pulse of visible light either before or just after the application of the voltage pulse to the sample. These experiments show that flashover can be inhibited by such a light pulse, and shed light on the relationship between the flashover mechanism and electric field inhomogeneities.
Keywords :
Breakdown voltage; Copper; Electric breakdown; Electrodes; Flashover; Plasma applications; Scanning electron microscopy; Semiconductor device breakdown; Silicon; Vacuum breakdown;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Conference, 1991. Digest of Technical Papers. Eighth IEEE International
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-0177-3
Type :
conf
DOI :
10.1109/PPC.1991.733247
Filename :
733247
Link To Document :
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