Highly Efficient Micromachined Bragg Mirrors Using Advanced DRIE Process

Author

Saadany, B. ; Khalil, D. ; Bourouina, T.

Author_Institution

ESIEE/Esycom-Lab., Noisy-le-Grand

fYear

2006

fDate

Dec. 2006

Firstpage

48

Lastpage

51

Abstract

A novel advanced deep reactive ion etching (DRIE) process technique is used to realize highly efficient vertical Bragg mirrors. The Bragg mirrors are realized by anisotropic etching of Si using DRIE, thus producing successive vertical interfaces between Si and air. The new etching technique is based on combining 2 steps of cryogenic and Bosch DRIE processes to obtain high quality Si walls in terms of both: high aspect ratio vertical walls as well as smooth surface. The realized Bragg mirrors, fabrication process, as well as measured optical performance showing the advantages of the new technique are presented

Keywords

micromachining; micromirrors; silicon; sputter etching; Bosch DRIE processes; Si; Si walls; anisotropic etching; cryogenic DRIE processes; deep reactive ion etching process; high aspect ratio vertical walls; micromachined Bragg mirrors; vertical Bragg mirrors; Etching; High speed optical techniques; Micromechanical devices; Mirrors; Optical devices; Optical filters; Optical interferometry; Optical refraction; Optical sensors; Optical variables control; Bragg Mirrors; Cryogenic DRIE; DRIE;

fLanguage

English

Publisher

ieee

Conference_Titel

MEMS, NANO and Smart Systems, The 2006 International Conference on

Conference_Location

Cairo

Print_ISBN

1-4244-0899-7

Type

conf

DOI

10.1109/ICMENS.2006.348215

Filename

4155232