Title :
Electron ionization, attachment and detachment coefficients in SF6 and Xe gas mixtures
Author :
Li, Xu-Guang ; Xiao, Deng-Ming ; Qiu, Yuchang ; Tsai, Shu-Jen ; Liu, Yilu
Author_Institution :
Dept. of Electr. Eng., Shanghai Jiao Tong Univ., China
Abstract :
In this paper, the authors present an analysis of the avalanche growth in electronegative gases, which exhibit detachment process in addition to ionization and attachment. The model is used to determine swarm parameters from a pulsed Townsend method. As an example, the swarm parameters for SF6-Xe are presented and discussed. A new swarm method for measurement of electron ionization, attachment and detachment from negative ions in SF6 and its mixtures is developed. The value of the transport coefficient of SF6-Xe is also given.
Keywords :
SF6 insulation; Townsend discharge; electron attachment; electron avalanches; electron detachment; electronegativity; gas mixtures; insulation testing; xenon; SF6-Xe; SF6-Xe gas mixtures; avalanche growth; detachment process; electron attachment; electron detachment; electron ionization; electronegative gases; insulation breakdown studies; pulsed Townsend method; swarm parameters; transport coefficient; Anodes; Cathodes; Electric breakdown; Electron mobility; Gases; Ionization; Joining processes; Partial differential equations; Sulfur hexafluoride; USA Councils;
Conference_Titel :
Power Engineering Society Summer Meeting, 2002 IEEE
Conference_Location :
Chicago, IL, USA
Print_ISBN :
0-7803-7518-1
DOI :
10.1109/PESS.2002.1043673
