DocumentCode
2397347
Title
Electron ionization, attachment and detachment coefficients in SF6 and Xe gas mixtures
Author
Li, Xu-Guang ; Xiao, Deng-Ming ; Qiu, Yuchang ; Tsai, Shu-Jen ; Liu, Yilu
Author_Institution
Dept. of Electr. Eng., Shanghai Jiao Tong Univ., China
Volume
3
fYear
2002
fDate
25-25 July 2002
Firstpage
1666
Abstract
In this paper, the authors present an analysis of the avalanche growth in electronegative gases, which exhibit detachment process in addition to ionization and attachment. The model is used to determine swarm parameters from a pulsed Townsend method. As an example, the swarm parameters for SF6-Xe are presented and discussed. A new swarm method for measurement of electron ionization, attachment and detachment from negative ions in SF6 and its mixtures is developed. The value of the transport coefficient of SF6-Xe is also given.
Keywords
SF6 insulation; Townsend discharge; electron attachment; electron avalanches; electron detachment; electronegativity; gas mixtures; insulation testing; xenon; SF6-Xe; SF6-Xe gas mixtures; avalanche growth; detachment process; electron attachment; electron detachment; electron ionization; electronegative gases; insulation breakdown studies; pulsed Townsend method; swarm parameters; transport coefficient; Anodes; Cathodes; Electric breakdown; Electron mobility; Gases; Ionization; Joining processes; Partial differential equations; Sulfur hexafluoride; USA Councils;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Engineering Society Summer Meeting, 2002 IEEE
Conference_Location
Chicago, IL, USA
Print_ISBN
0-7803-7518-1
Type
conf
DOI
10.1109/PESS.2002.1043673
Filename
1043673
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