Title :
Diagnostic system for IC manufacturing
Author :
Kibarian, John K. ; Strojwas, Andrzej J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
A diagnostic system for intrawafer variability analysis which is part of the CMU (Carnegie Mellon University) diagnostic system is described. The system presented can be used to analyze parametric data for the purposes of understanding the causes of yield loss. Data from an industrial fabrication line were analyzed to show the validity of the approach. Key features of this approach are a brief learning phase and the ability to use both spatial information and electrical characteristics in the analysis. The intrawafer variability analysis system can interpret the data by comparing the features with either historical data, test structure measurements, or simulated sensitivity information. This is possible because of the flexibility built into the feature selection method
Keywords :
integrated circuit manufacture; integrated circuit testing; production testing; IC manufacturing; diagnostic system; electrical characteristics; feature selection method; industrial fabrication line; intrawafer variability analysis; parametric data; sensitivity information; spatial information; test structure measurements; yield loss; Computer aided manufacturing; Computer integrated manufacturing; Costs; Fabrication; Integrated circuit manufacture; Manufacturing industries; Manufacturing processes; Performance evaluation; Process design; Textile industry;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1991. ASMC 91 Proceedings. IEEE/SEMI 1991
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-0152-8
DOI :
10.1109/ASMC.1991.167392
