Load Balancing among Photolithography Machines in Semiconductor Manufacturing

Author

Shr, Arthur M D ; Liu, Alan ; Chen, Peter P.

Author_Institution

Dept. of Electr. Eng., Nat. Chung Cheng Univ., Chia-Yi

fYear

2006

fDate

Sept. 2006

Firstpage

320

Lastpage

325

Abstract

We propose a multiagent scheduling system (MSS) based on a resource schedule and execution matrix (RSEM) to tackle the issue of load balancing among photolithography machines in semiconductor manufacturing. This issue is derived from the dedicated photolithography machine constraint. It is one of the new challenges introduced in photolithography machinery due to natural bias. However, many scheduling policies or modeling methods proposed by previous research for the semiconductor manufacturing production have not addressed the load balancing issue and dedicated machine constraint. In this paper, we describe the design of the proposed MSS approach in detail, including the system architecture, coordination strategy, and its scheduling method on the RSEM. We also present the simulation results that validate the approach

Keywords

matrix algebra; multi-agent systems; photolithography; resource allocation; scheduling; semiconductor device manufacture; coordination strategy; dedicated machine constraint; load balancing; multiagent scheduling system; photolithography machine; resource schedule and execution matrix; semiconductor manufacturing; system architecture; Job shop scheduling; Lithography; Load management; Machinery; Manufacturing processes; Manufacturing systems; Production facilities; Semiconductor device manufacture; Telephony; Virtual manufacturing; Dedicated Machine Constraint; Load Balancing; Multiagent Scheduling System; Resource Schedule and Execution Matrix;

fLanguage

English

Publisher

ieee

Conference_Titel

Intelligent Systems, 2006 3rd International IEEE Conference on

Conference_Location

London

Print_ISBN

1-4244-01996-8

Electronic_ISBN

1-4244-01996-8

Type

conf

DOI

10.1109/IS.2006.348439

Filename

4155446