• DocumentCode
    2398910
  • Title

    RVLSI applications and physical design

  • Author

    Anderson, Allan H. ; Berger, Robert ; Konkle, Kenneth H. ; Rhodes, F. Matthew

  • Author_Institution
    MIT Lincoln Lab., Lexington, MA, USA
  • fYear
    1989
  • fDate
    3-5 Jan 1989
  • Firstpage
    39
  • Lastpage
    45
  • Abstract
    Improvements in circuits density and yield have permitted restructurable VLSI wafer-scale circuits to be designed with three million transistors. The integrated power supply decoupling capacitors and denser wafer-scale interconnect used in these designs are described. Improved testing methods are required for larger designs
  • Keywords
    VLSI; integrated circuit testing; laser beam machining; redundancy; circuits density; integrated power supply decoupling capacitors; physical design; restructurable VLSI; testing methods; wafer-scale circuits; wafer-scale interconnect; yield; Clocks; Foundries; Integrated circuit interconnections; Integrated circuit yield; Laboratories; Power capacitors; Power supplies; Power system interconnection; Radar tracking; Registers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wafer Scale Integration, 1989. Proceedings., [1st] International Conference on
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-8186-9901-9
  • Type

    conf

  • DOI
    10.1109/WAFER.1989.47534
  • Filename
    47534