DocumentCode :
2398949
Title :
Analysis of dynamic characteristics in a-Si TFT structures (for active-matrix LCD)
Author :
Kitazawa, Tomoko ; Shibusawa, Makoto ; Higuchi, Toyoki
Author_Institution :
Toshiba Corp., Yokohama, Japan
fYear :
1991
fDate :
15-17 Oct. 1991
Firstpage :
89
Lastpage :
92
Abstract :
Active-matrix LCDs (liquid crystal displays) addressed by a-Si (amorphous silicon) TFTs (thin-film transistors) are being developed for graphic displays such as computer terminals. Three types of TFTs, a back-channel-etched TFT, a trilayered TFT, and a self-aligned TFT, have been developed. The authors describe the dynamic characteristics of these TFTs, especially level shift in pixel voltage. First, the dependence of the level shift voltage both on drain voltage and on gate pulse delay is demonstrated. The difference of the level shift caused by the TFT structure is then clarified. Then these results are compared to those of SPICE simulation.<>
Keywords :
amorphous semiconductors; elemental semiconductors; liquid crystal displays; silicon; thin film transistors; SPICE simulation; active-matrix LCD; amorphous Si thin film transistors; back-channel-etched TFT; drain voltage; dynamic characteristics; gate pulse delay; graphic displays; level shift; pixel voltage; self-aligned TFT; trilayered TFT; Active matrix liquid crystal displays; Amorphous silicon; Computer displays; Computer graphics; Computer peripherals; Delay; Liquid crystal displays; SPICE; Thin film transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Display Research Conference, 1991., Conference Record of the 1991 International
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-0213-3
Type :
conf
DOI :
10.1109/DISPL.1991.167440
Filename :
167440
Link To Document :
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