Title :
SIMOX sculpting of 3-D nano-optical structures
Author :
Koonath, Prakash ; Kishima, Koichiro ; Indukuri, Tejaswi ; Jalali, Bahram
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
Abstract :
In this paper, fabrication of three dimensionally integrated nano-optical structures in silicon-on-insulator (SOI) substrates using the process of separation by implantation of oxygen (SIMOX) is reported. Buried rib waveguides with lowest ever loss with the SIMOX process, reported with the fabrication of vertically integrated structures using conventional lithography and etching process, demonstrate the capability to sculpt 3-D integrated optical devices.
Keywords :
SIMOX; elemental semiconductors; etching; integrated optics; integrated optoelectronics; nanolithography; nanostructured materials; optical fabrication; optical losses; optical waveguides; rib waveguides; silicon; substrates; SIMOX; SOI; Si-SiO2; etching; lithography; rib waveguide; separation by implantation of oxygen; silicon-on-insulator substrate; three dimensional integrated optical device; three dimensional nano-optical structure; vertically integrated structure fabrication; Annealing; Nanostructures; Optical device fabrication; Optical devices; Optical losses; Optical waveguides; Oxygen; Propagation losses; Silicon; Substrates;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1252937
