Title :
Two-level grammar as an object-oriented requirements specification language
Author :
Bryant, Barrett R. ; Lee, Beum-Seuk
Author_Institution :
Dept. of Comput. & Inf. Sci., Alabama Univ., Birmingham, AL, USA
Abstract :
Two-level grammar (TLG) is proposed as an object-oriented requirements specification language with a natural language (NL) style but sufficiently formal to allow automatic transformation of the TLG specification into formal specifications in VDM++, an object-oriented version of the Vienna Development Method. The VDM++ specification may be further transformed into JavaTM code or integrated with the Unified Modeling Language (UML) using the IFAD VDMToolboxTM. The translation into an executable programming language facilitates rapid prototyping of TLG specifications and the integration with UML allows TLG specification to be used in conjunction with software systems being constructed using UML. This software specification approach is supported by a specification development environment (SDE) for constructing TLG specifications and a natural language processing system to assist in translating can NL requirements specification into TLG. The system described is a useful and constructive tool for automating the production of software systems from NL specifications.
Keywords :
Vienna development method; formal specification; grammars; object-oriented languages; specification languages; IFAD VDM Toolbox; Java code; UML; VDM++; automatic transformation; executable programming language; formal specifications; natural language style; object-oriented Vienna Development Method; object-oriented requirements specification language; rapid prototyping; software specification; specification development environment; two-level grammar; Computer languages; Formal specifications; Java; Natural language processing; Natural languages; Production systems; Software prototyping; Software systems; Specification languages; Unified modeling language;
Conference_Titel :
System Sciences, 2002. HICSS. Proceedings of the 35th Annual Hawaii International Conference on
Print_ISBN :
0-7695-1435-9
DOI :
10.1109/HICSS.2002.994486