DocumentCode :
2400343
Title :
Novel method to generate inspection care areas using GDS
Author :
Kang, HoSung ; Kim, MinHo ; Kim, KiHo ; SooCheol Lee ; Choi, JungA ; Pae, YeonHo ; Changho Lee ; Lee, Chris
Author_Institution :
Syst. LSI Div., Samsung Electron. Co., Ltd., Yongin, South Korea
fYear :
2009
fDate :
10-12 May 2009
Firstpage :
14
Lastpage :
16
Abstract :
In order to make wafer inspection more sensitive, it is necessary to create inspection care areas that better reflect the actual layout of features in each die. However, it is very time consuming and tedious to draw such care areas manually. In this work, we proposed a novel method to generate suitable care areas using GDS. Two innovative ways were developed and enabled this method to be implemented in a mass production.
Keywords :
inspection; microassembling; inspection care areas; mass production; wafer inspection; Data mining; Detection algorithms; Electronic design automation and methodology; Inspection; Large scale integration; Mass production; Metrology; Permission; Physics computing; Robustness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
ISSN :
1078-8743
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2009.5155944
Filename :
5155944
Link To Document :
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