• DocumentCode
    2400495
  • Title

    Design-for-manufacturing features in nanometer processes - A reverse engineering perspective

  • Author

    James, Dick

  • Author_Institution
    Chipworks Inc., Ottawa, ON, Canada
  • fYear
    2009
  • fDate
    10-12 May 2009
  • Firstpage
    56
  • Lastpage
    61
  • Abstract
    The first decade of the new millennium has seen the introduction of a suite of production disciplines known collectively as design for manufacturability (DFM). While there has been no formal definition of DFM, we can regard it broadly as the techniques used to co-optimise design, layout, and processing to reduce variability and improve manufacturing parameters, with the aim of increasing yield and reliability. Retrospectively, we can view design rule checking, and the dummy features used to improve CMP, as early forms of DFM.
  • Keywords
    design for manufacture; nanotechnology; reverse engineering; design-for-manufacturing; nanometer process; reverse engineering; Design for manufacture; Dielectrics; Manufacturing industries; Manufacturing processes; Metallization; Process design; Production; Reverse engineering; Semiconductor device manufacture; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
  • Conference_Location
    Berlin
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4244-3614-9
  • Electronic_ISBN
    1078-8743
  • Type

    conf

  • DOI
    10.1109/ASMC.2009.5155953
  • Filename
    5155953