DocumentCode
2400495
Title
Design-for-manufacturing features in nanometer processes - A reverse engineering perspective
Author
James, Dick
Author_Institution
Chipworks Inc., Ottawa, ON, Canada
fYear
2009
fDate
10-12 May 2009
Firstpage
56
Lastpage
61
Abstract
The first decade of the new millennium has seen the introduction of a suite of production disciplines known collectively as design for manufacturability (DFM). While there has been no formal definition of DFM, we can regard it broadly as the techniques used to co-optimise design, layout, and processing to reduce variability and improve manufacturing parameters, with the aim of increasing yield and reliability. Retrospectively, we can view design rule checking, and the dummy features used to improve CMP, as early forms of DFM.
Keywords
design for manufacture; nanotechnology; reverse engineering; design-for-manufacturing; nanometer process; reverse engineering; Design for manufacture; Dielectrics; Manufacturing industries; Manufacturing processes; Metallization; Process design; Production; Reverse engineering; Semiconductor device manufacture; Semiconductor materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location
Berlin
ISSN
1078-8743
Print_ISBN
978-1-4244-3614-9
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2009.5155953
Filename
5155953
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