DocumentCode
2400909
Title
SACVD clean investigation with a new calorimetric probe sensor
Author
Kunstmann, Thomas ; Paulus, Stefan ; Chen, Ing-Shin ; Auer, Horst ; Feng, Lin ; Chism, Richard ; Roeder, Jeffrey F.
Author_Institution
Infineon Technol. AG, Regensburg, Germany
fYear
2009
fDate
10-12 May 2009
Firstpage
155
Lastpage
160
Abstract
Doped and undoped SACVD recipes were investigated with respect to their clean performance with a new calorimetric probe sensor. Endpoint curves were collected with a standalone software utility, and results were analyzed post-acquisition offline. The impact of preventive maintenance (PM) activities and different single/multiple cleans towards clean performance were investigated. A numerical model for the clean behavior after annual chamber PM´s was developed. Clean time optimization was carried out for different recipes.
Keywords
calorimetry; plasma CVD; plasma sources; probes; sensors; surface cleaning; calorimetric probe sensor; clean time optimization; endpoint curves; numerical model; preventive maintenance; remote plasma source; standalone software utility; subatmospheric CVD; Argon; Effluents; Hardware; Liquids; Monitoring; Numerical models; Preventive maintenance; Probes; Production; Valves;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location
Berlin
ISSN
1078-8743
Print_ISBN
978-1-4244-3614-9
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2009.5155974
Filename
5155974
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