DocumentCode :
2401079
Title :
Advances on yield learning through concurrent evaluation of design and process data
Author :
Appello, Davide ; Tancorre, Vincenzo ; Suzor, Christophe ; Hall, Michael ; Talluto, Salvatore ; Kekare, Sagar A.
Author_Institution :
STMicroelectronics Srl, Agrate Brianza, Italy
fYear :
2009
fDate :
10-12 May 2009
Firstpage :
206
Lastpage :
210
Abstract :
This paper presents advances in methodologies and tools for yield learning which are concurrently exploiting design, test and process data. In our experiments, we demonstrated how to understand yield losses correlated with excessive power drawn from the chip during functional electrical test of wafers.
Keywords :
integrated circuit testing; integrated circuit yield; design concurrent evaluation; electrical test; process data concurrent evaluation; wafers functional test; yield learning; yield losses; Automatic test pattern generation; Automatic testing; Circuit faults; Circuit testing; Design for testability; Failure analysis; Logic; Paper technology; Process design; Reliability engineering; ATPG; hot spots; scan chain; systematic failures; volume diagnostics; yield learning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
ISSN :
1078-8743
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2009.5155984
Filename :
5155984
Link To Document :
بازگشت