DocumentCode
2401108
Title
Application and control of Laser Anneal at the 65 and 45 nm node
Author
Van Roijen, R. ; Gluchenkov, O. ; Willis, J. ; Hurley, M.
Author_Institution
IBM Syst. & Technol. Group, Hopewell Junction, NY, USA
fYear
2009
fDate
10-12 May 2009
Firstpage
217
Lastpage
219
Abstract
The application of laser anneal to semiconductor manufacturing is shown to have advantages and challenges for process control. We discuss some results, the implications of the real-time control mechanism on the ultra-tech anneal tool, the impact of patterning effects and the use of inline data to ensure the tool achieves the target anneal condition.
Keywords
laser beam annealing; nanopatterning; process control; real-time systems; semiconductor device manufacture; laser anneal control; patterning effect; process control; real-time control mechanism; semiconductor manufacturing; size 45 nm; size 65 nm; FETs; Laser beams; Optical control; Optical sensors; Power lasers; Process control; Rapid thermal annealing; Rapid thermal processing; Semiconductor lasers; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location
Berlin
ISSN
1078-8743
Print_ISBN
978-1-4244-3614-9
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2009.5155986
Filename
5155986
Link To Document