Title :
Application and control of Laser Anneal at the 65 and 45 nm node
Author :
Van Roijen, R. ; Gluchenkov, O. ; Willis, J. ; Hurley, M.
Author_Institution :
IBM Syst. & Technol. Group, Hopewell Junction, NY, USA
Abstract :
The application of laser anneal to semiconductor manufacturing is shown to have advantages and challenges for process control. We discuss some results, the implications of the real-time control mechanism on the ultra-tech anneal tool, the impact of patterning effects and the use of inline data to ensure the tool achieves the target anneal condition.
Keywords :
laser beam annealing; nanopatterning; process control; real-time systems; semiconductor device manufacture; laser anneal control; patterning effect; process control; real-time control mechanism; semiconductor manufacturing; size 45 nm; size 65 nm; FETs; Laser beams; Optical control; Optical sensors; Power lasers; Process control; Rapid thermal annealing; Rapid thermal processing; Semiconductor lasers; Temperature control;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2009.5155986
