Title :
Deep UV lithography for planar photonic crystal structures
Author :
Bogaerts, Wim ; Dumon, Pieter ; Van Campenhout, Joris ; Wiaux, Vincent ; Wouters, Johan ; Beckx, Stephan ; Taillaert, Dirk ; Luyssaert, Bert ; Van Thourhout, Dries ; Baets, Roel
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Belgium
Abstract :
We demonstrate deep UV lithography at 248 nm to be a useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses.
Keywords :
light propagation; optical fabrication; optical losses; photonic crystals; ultraviolet lithography; 248 nm; deep UV lithography; fabrication tool; low propagation losses; nanophotonics; planar photonic crystal structure; telecom wavelength; Etching; Gratings; Lithography; Optical device fabrication; Optical fiber couplers; Optical fiber polarization; Optical losses; Optical waveguides; Photonic crystals; Silicon;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1253020
