Title :
Scalability of SOI CMOS technology and circuit to millimeter wave performance
Author :
Plouchart, Jean-Olivier ; Kim, Jonghae ; Gross, Jeff ; Trzcinski, Robert ; Wu, Kun
Author_Institution :
IBM Semicond. R&D Center, USA
fDate :
30 Oct.-2 Nov. 2005
Abstract :
This paper presents the high-frequency performance of the 130 and 90-nm SOI technologies as well as its integration capabilities and scalability. With a measured 303-GHz Ft, 1.6-mS/μm gm, and sub 1.1-dB NFmin up to 26-GHz the SOI NMOS transistors exhibits performances ahead of the ITRS roadmap. Passives are integrated in the microprocessor back-end, and the 1.8fF/μm2 capacitance density of the vertical native capacitor (VNCAP) in a 90nm SOI CMOS improves by 28%, as compared to a 120 nm SOI CMOS. In the circuit design section, we will show how this high-level of performance will expand the use of CMOS to high-performance millimeter-wave applications with examples of such circuits for frequency generation, and amplification.
Keywords :
CMOS integrated circuits; integrated circuit design; microprocessor chips; millimetre wave circuits; silicon-on-insulator; 130 nm; 303 GHz; 90 nm; CMOS technology; NMOS transistors; SOI; amplification; circuit design; frequency generation; microprocessor back-end; millimeter-wave applications; vertical native capacitor; CMOS technology; Integrated circuit measurements; Integrated circuit technology; MOSFETs; Millimeter wave circuits; Millimeter wave measurements; Millimeter wave technology; Millimeter wave transistors; Performance evaluation; Scalability;
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05. IEEE
Print_ISBN :
0-7803-9250-7
DOI :
10.1109/CSICS.2005.1531780