DocumentCode
2406310
Title
Emerging floating-body effects in advanced partially-depleted SOI devices
Author
Poiroux, T. ; Faynot, O. ; Tabone, C. ; Tigelaar, H. ; Mogul, H. ; Bresson, N. ; Cristoloveanu, S.
Author_Institution
CEA-DRT - LETI/DDTS - CEA/GRE, Grenoble, France
fYear
2002
fDate
7-10 Oct 2002
Firstpage
99
Lastpage
100
Abstract
In recent technologies, the aggressive scaling of the gate oxide thickness leads to significant increase in gate currents. In case of SOI technology, the gate-to-body component has to be considered carefully, since it strongly impacts the history effects In this paper, we study its effect on partially-depleted floating-body device. behaviour. Generation and recombination transients are analyzed by correlating drain current and body potential measurements performed on body contacted devices. Impact on history effect is also studied, considering not only first and second switches, but the complete simulation until steady-state.
Keywords
MOSFET; electron-hole recombination; elemental semiconductors; semiconductor device measurement; semiconductor device models; silicon; silicon-on-insulator; transients; MOSFETs; SOI technology; Si-SiO2; advanced partially-depleted SOI devices; body contacted devices; body potential; drain current; first switches; floating-body effects; gate currents; gate oxide thickness; history effects; partially-depleted floating-body device; recombination transients; second switches; simulation; steady-state; Charge carrier lifetime; MOSFETs; Semiconductor device modeling; Silicon; Silicon on insulator technology;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, IEEE International 2002
Print_ISBN
0-7803-7439-8
Type
conf
DOI
10.1109/SOI.2002.1044434
Filename
1044434
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