• DocumentCode
    2406310
  • Title

    Emerging floating-body effects in advanced partially-depleted SOI devices

  • Author

    Poiroux, T. ; Faynot, O. ; Tabone, C. ; Tigelaar, H. ; Mogul, H. ; Bresson, N. ; Cristoloveanu, S.

  • Author_Institution
    CEA-DRT - LETI/DDTS - CEA/GRE, Grenoble, France
  • fYear
    2002
  • fDate
    7-10 Oct 2002
  • Firstpage
    99
  • Lastpage
    100
  • Abstract
    In recent technologies, the aggressive scaling of the gate oxide thickness leads to significant increase in gate currents. In case of SOI technology, the gate-to-body component has to be considered carefully, since it strongly impacts the history effects In this paper, we study its effect on partially-depleted floating-body device. behaviour. Generation and recombination transients are analyzed by correlating drain current and body potential measurements performed on body contacted devices. Impact on history effect is also studied, considering not only first and second switches, but the complete simulation until steady-state.
  • Keywords
    MOSFET; electron-hole recombination; elemental semiconductors; semiconductor device measurement; semiconductor device models; silicon; silicon-on-insulator; transients; MOSFETs; SOI technology; Si-SiO2; advanced partially-depleted SOI devices; body contacted devices; body potential; drain current; first switches; floating-body effects; gate currents; gate oxide thickness; history effects; partially-depleted floating-body device; recombination transients; second switches; simulation; steady-state; Charge carrier lifetime; MOSFETs; Semiconductor device modeling; Silicon; Silicon on insulator technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, IEEE International 2002
  • Print_ISBN
    0-7803-7439-8
  • Type

    conf

  • DOI
    10.1109/SOI.2002.1044434
  • Filename
    1044434