The effect of track width and topography on composition uniformity of electroplated permalloy in thin film heads

Author

Sahaml, S. ; Lee, H.P.

Author_Institution

IBM Corporation

fYear

1992

fDate

13-16 April 1992

Firstpage

Lastpage

Keywords

Current density; Dry etching; Electrons; Magnetic films; Magnetic heads; Poles and zeros; Sputter etching; Sputtering; Surfaces; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 1992. Digests of Intermag '92., International

Conference_Location

St. Louis, MO, USA

Print_ISBN

0-7803-0637-6

Type

DOI

10.1109/INTMAG.1992.696186

Filename

696186

Link To Document