• DocumentCode
    2406696
  • Title

    90nm SOI-CMOS of 150GHz fmax and 0.8dB NFmin @6GHz for SOC

  • Author

    Vanmackelberg, M. ; Boret, S. ; Gloria, D. ; Rozeau, O. ; Gwoziecki, R. ; Raynaud, C. ; Lepilliet, S. ; Dambrine, G.

  • Author_Institution
    IEMN, Villeneuve d´´Ascq, France
  • fYear
    2002
  • fDate
    7-10 Oct 2002
  • Firstpage
    153
  • Lastpage
    154
  • Abstract
    Recently, CMOS devices with 150 GHz fmax have been reported with a 0.18 μm bulk CMOS technology. This paper describes a complete high frequency characterization of MOSFET devices obtained with a 0.13 μm partially-depleted SOI technology, including for the first time microwave noise parameters on 90 nm SOI devices. A high fmax of 150 GHz and a low minimum noise figure of 0.8 dB with an associated gain of 16 dB @ 6 GHz have been obtained @1.2V under low power consumption (7mW).
  • Keywords
    CMOS integrated circuits; MOSFET; semiconductor device noise; silicon-on-insulator; system-on-chip; 150 GHz; 6 GHz; 90 nm; MOSFET; SOI-CMOS; bulk CMOS technology; high frequency characterization; microwave noise parameters; minimum noise figure; partially-depleted SOI technology; system-on-a-chip; CMOS integrated circuits; MOSFETs; Semiconductor device noise; Silicon on insulator technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, IEEE International 2002
  • Print_ISBN
    0-7803-7439-8
  • Type

    conf

  • DOI
    10.1109/SOI.2002.1044456
  • Filename
    1044456