• DocumentCode
    2407890
  • Title

    High quality factor etchless silicon photonic ring resonators

  • Author

    Luo, Lian-Wee ; Gustavo, S.W. ; Cardenas, Jaime ; Lipson, Michal

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
  • fYear
    2010
  • fDate
    14-16 Dec. 2010
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We demonstrate high-Q silicon ring resonators fabricated by selective oxidation without any silicon etching. We achieve an intrinsic quality factor of 510,000 in 50 μm-radius ring resonators with ring losses of 0.8 dB/cm.
  • Keywords
    Q-factor; elemental semiconductors; integrated optics; optical fabrication; optical losses; optical resonators; optical waveguides; oxidation; silicon; silicon-on-insulator; Si; Si-SiO2; etchless silicon photonic ring resonators; optical fabrication; quality factor; radius 50 mum; ring losses; selective oxidation; silicon waveguides; silicon-on-insulator wafer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics Global Conference (PGC), 2010
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-9882-6
  • Type

    conf

  • DOI
    10.1109/PGC.2010.5706128
  • Filename
    5706128
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2407890