Modelling and characterisation of a VOA with different shutter thickness

Author

Maaty, H. ; Bashir, A. ; Saadany, B. ; Khalil, D.

Author_Institution

MEMScAP Egypt, Cairo, Egypt

fYear

2002

fDate

2002

Firstpage

117

Lastpage

122

Abstract

In this work, we study the effect of the shutter thickness on the optical attenuation in an optomechanical variable optical attenuator. Both experimental and simulation results show a maximum in the received optical field with the shutter displacement, which increases at large shutter thickness. This behaviour has not been reported or analysed before

Keywords

fast Fourier transforms; finite difference methods; micro-optics; modelling; optical communication equipment; optical elements; waveguide attenuators; wavelength division multiplexing; FFT-BPM; Gaussian beam; MEMS based shutter; WDM systems; attenuation curve; gain equalization; knife-edge shutter; linearity; modelling; optomechanical variable optical attenuator; received optical field; sensitivity; shutter displacement; shutter thickness effect; Insertion loss; Micromechanical devices; Optical attenuators; Optical fiber devices; Optical fiber polarization; Optical interferometry; Optical refraction; Optical saturation; Optical variables control; Stimulated emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics and Its Application at Egyptian Engineering Faculties and Institutes, 2002. Third Workshop on

Conference_Location

Giza

Print_ISBN

0-7803-7163-1

Type

conf

DOI

10.1109/PAIA.2002.995084

Filename

995084