• DocumentCode
    2408697
  • Title

    Modeling and simulation of thin film decoupling capacitors

  • Author

    Chen, K.Y. ; Brown, W.D. ; Schaper, L.W.

  • Author_Institution
    Dept. of Electr. Eng., Arkansas Univ., Fayetteville, AR, USA
  • fYear
    1998
  • fDate
    26-28 Oct 1998
  • Firstpage
    205
  • Lastpage
    208
  • Abstract
    Thin film decoupling capacitors with a novel structure were modeled and their performance simulated. The influences of contact configurations and dielectric and metal layer thicknesses on the impedance behaviour were studied. Simulation shows that thin film capacitors have excellent high frequency properties
  • Keywords
    dielectric thin films; electric impedance; electrical contacts; electronic engineering computing; metallisation; microwave devices; thin film capacitors; contact configuration; dielectric layer thickness; high frequency properties; impedance behaviour; metal layer thickness; modeling; performance simulation; simulation; thin film capacitors; thin film decoupling capacitor structure; thin film decoupling capacitors; Capacitors; Contacts; Dielectric measurements; Dielectric thin films; Frequency; Impedance measurement; Inductance; Printed circuits; Thin film circuits; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Performance of Electronic Packaging, 1998. IEEE 7th Topical Meeting on
  • Conference_Location
    West Point, NY
  • Print_ISBN
    0-7803-4965-2
  • Type

    conf

  • DOI
    10.1109/EPEP.1998.733978
  • Filename
    733978