The helium ion microscope for high resolution imaging, materials analysis and FA applications

The scanning helium ion microscope (HIM) is capable of sub-nanometer resolution using ion induced secondary electron (SE) mode and back scattered ion (RBI) mode imaging. In addition to its long working distance and sub-nanometer resolution, the helium ion microscope in RBI mode provides contrast that is material Z dependent on a nanometer scale. By the complementary use of charge neutralizing electrons, the helium ion microscope can image dielectric materials at full beam energy and maximum resolution without the need for sample coating. This paper will describe the physics of the subatomic virtual source, the systempsilas ion optics, the types of detectors used, the substrate interactions involved with SE and RBI imaging and the applicability of the helium ion microscope to materials and failure analysis problem solving.