• DocumentCode
    2409074
  • Title

    Circuit and platform design challenges in technologies beyond 90nm

  • Author

    Grundmann, Bill ; Galivanche, Rajesh ; Kundu, Sandip

  • Author_Institution
    Dept. of Design Technol., Intel Corp., Hillsboro, OR, USA
  • fYear
    2003
  • fDate
    2003
  • Firstpage
    44
  • Lastpage
    47
  • Abstract
    There are already a huge number of problems for silicon designers and it is likely to just get worse. Many of these problems are technical, associated with shrinking geometries and increasing architecture complexities, but there are a significant number that seem to be caused by procedurally related mistakes and issues. Many of the technical problems are solved and re-solved on a piecemeal basis, focusing on local optimizations of small design-space problems. Unfortunately, many of these local solutions really create a less apparent but larger inefficiency in the whole design flow. The reason for this is that few ever look at the whole design methodology, especially as it applies to large design teams. As a consequence, this lack of oversight for the whole methodology is causing project procedural problems and inefficiencies.
  • Keywords
    design engineering; integrated circuit design; nanoelectronics; project engineering; 90 nm; architecture complexity increase; circuit design; design flow inefficiency; design methodology; large design teams; local optimizations; nanoelectronics; platform design; procedurally related mistakes; shrinking geometries; technical problem solution; Circuits; Costs; Design methodology; Design optimization; Geometry; History; Moore´s Law; Silicon; Terminology; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Automation and Test in Europe Conference and Exhibition, 2003
  • ISSN
    1530-1591
  • Print_ISBN
    0-7695-1870-2
  • Type

    conf

  • DOI
    10.1109/DATE.2003.1253585
  • Filename
    1253585