• DocumentCode
    2410194
  • Title

    A rigorous model for trapping and detrapping in thin gate dielectrics

  • Author

    Goes, Wolfgang ; Karner, Markus ; Sverdlov, Viktor ; Grasser, Tibor

  • Author_Institution
    Christian Doppler Lab. for TCAD, Tech. Univ. Wien, Vienna
  • fYear
    2008
  • fDate
    7-11 July 2008
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    We rigorously model charge trapping and detrapping in ultrathin dielectrics. In addition to charge exchange with the substrate, the poly-gate interface is taken into account which gives rise to decreased charge trapping compared to conventional models designed for thicker gate dielectrics. Finally, an extension of this model also accounting for the shift of trap levels may possibly explain the large time scales experimentally observed during the recovery after application of an on-state voltage.
  • Keywords
    dielectric thin films; electron traps; hole traps; hot carriers; charge detrapping model; charge trapping model; hot carrier injection; on-state voltage; polygate interface; thicker gate dielectrics comparison; thin gate dielectrics; Annealing; Charge carriers; Dielectric substrates; Electron traps; Laboratories; Microelectronics; Niobium compounds; Silicon; Titanium compounds; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2008. IPFA 2008. 15th International Symposium on the
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-2039-1
  • Electronic_ISBN
    978-1-4244-2040-7
  • Type

    conf

  • DOI
    10.1109/IPFA.2008.4588197
  • Filename
    4588197