DocumentCode
2413406
Title
Experimental study of single source-heterojunction MOS transistors (SHOTs) under quasi-ballistic transport
Author
Mizuno, T. ; Moriyama, Y. ; Tezuka, T. ; Sugiyama, N. ; Takagi, S.
Author_Institution
MIRAI-AIST, Kawasaki
fYear
2008
fDate
17-19 June 2008
Firstpage
22
Lastpage
23
Abstract
In this study, we have experimentally demonstrated the high performance of the single source heterojunction MOSFETs (SHOTs) without the energy spike of the drain heterojuction. We have studied the influence of the drain energy spike on the MOSFET performance. Moreover, we have clarified the physical mechanism for the high velocity electron injection in SHOTs, through the lattice temperature dependence of the electron velocity, comparing with that of strained-SOIs (SSOIs).
Keywords
MOSFET; system-on-chip; drain heterojuction; energy spike; quasiballistic transport; single source heterojunction MOSFET; single source-heterojunction MOS transistors; strained-SOI; Electron mobility; Heterojunctions; Kinetic energy; Lattices; MOSFETs; Phonons; Rapid thermal processing; Scattering; Temperature dependence; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 2008 Symposium on
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-1802-2
Electronic_ISBN
978-1-4244-1803-9
Type
conf
DOI
10.1109/VLSIT.2008.4588548
Filename
4588548
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