DocumentCode :
2413406
Title :
Experimental study of single source-heterojunction MOS transistors (SHOTs) under quasi-ballistic transport
Author :
Mizuno, T. ; Moriyama, Y. ; Tezuka, T. ; Sugiyama, N. ; Takagi, S.
Author_Institution :
MIRAI-AIST, Kawasaki
fYear :
2008
fDate :
17-19 June 2008
Firstpage :
22
Lastpage :
23
Abstract :
In this study, we have experimentally demonstrated the high performance of the single source heterojunction MOSFETs (SHOTs) without the energy spike of the drain heterojuction. We have studied the influence of the drain energy spike on the MOSFET performance. Moreover, we have clarified the physical mechanism for the high velocity electron injection in SHOTs, through the lattice temperature dependence of the electron velocity, comparing with that of strained-SOIs (SSOIs).
Keywords :
MOSFET; system-on-chip; drain heterojuction; energy spike; quasiballistic transport; single source heterojunction MOSFET; single source-heterojunction MOS transistors; strained-SOI; Electron mobility; Heterojunctions; Kinetic energy; Lattices; MOSFETs; Phonons; Rapid thermal processing; Scattering; Temperature dependence; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2008 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-1802-2
Electronic_ISBN :
978-1-4244-1803-9
Type :
conf
DOI :
10.1109/VLSIT.2008.4588548
Filename :
4588548
Link To Document :
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