DocumentCode
2414691
Title
32nm device architecture optimization for critical path speed improvement
Author
Gwoziecki, R. ; Kohler, S. ; Arnaud, F.
Author_Institution
STMicroelectron., Crolles
fYear
2008
fDate
17-19 June 2008
Firstpage
180
Lastpage
181
Abstract
This study investigates key elements improving CMOS critical path speed. We proposed a full analysis of input signal slope impact on the switching current trajectories depending on Vt centering. Based on inverter output characteristics shape, we demonstrated that speed of low-Vt (LVT) path preferred higher drive current (ION) whereas high-Vt (HVT) cells speed is enhanced by lower drain induced barrier lowering (DIBL). Finally, we proposed a link with transistor architecture by optimizing halos and light-doping-drain (LDD) design to improve logic gate as a function of Vt options.
Keywords
CMOS integrated circuits; optimisation; CMOS critical path speed; input signal slope impact; inverter output characteristic; size 32 nm; switching current trajectories; CMOS logic circuits; Delay; Design optimization; Electronic mail; Inverters; Logic devices; Logic gates; Microelectronics; Shape; Signal analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 2008 Symposium on
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-1802-2
Electronic_ISBN
978-1-4244-1803-9
Type
conf
DOI
10.1109/VLSIT.2008.4588610
Filename
4588610
Link To Document