• DocumentCode
    2414691
  • Title

    32nm device architecture optimization for critical path speed improvement

  • Author

    Gwoziecki, R. ; Kohler, S. ; Arnaud, F.

  • Author_Institution
    STMicroelectron., Crolles
  • fYear
    2008
  • fDate
    17-19 June 2008
  • Firstpage
    180
  • Lastpage
    181
  • Abstract
    This study investigates key elements improving CMOS critical path speed. We proposed a full analysis of input signal slope impact on the switching current trajectories depending on Vt centering. Based on inverter output characteristics shape, we demonstrated that speed of low-Vt (LVT) path preferred higher drive current (ION) whereas high-Vt (HVT) cells speed is enhanced by lower drain induced barrier lowering (DIBL). Finally, we proposed a link with transistor architecture by optimizing halos and light-doping-drain (LDD) design to improve logic gate as a function of Vt options.
  • Keywords
    CMOS integrated circuits; optimisation; CMOS critical path speed; input signal slope impact; inverter output characteristic; size 32 nm; switching current trajectories; CMOS logic circuits; Delay; Design optimization; Electronic mail; Inverters; Logic devices; Logic gates; Microelectronics; Shape; Signal analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 2008 Symposium on
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    978-1-4244-1802-2
  • Electronic_ISBN
    978-1-4244-1803-9
  • Type

    conf

  • DOI
    10.1109/VLSIT.2008.4588610
  • Filename
    4588610