DocumentCode :
241509
Title :
Charging effect in silicon nanocrystals observed by electrostatic and Kelvin-probe force microscopy
Author :
Jie Xu ; Jun Xu ; Dan Shan ; Wei Li ; Ling Xu ; Linwei Yu ; Kunji Chen
Author_Institution :
Nat. Lab. of Solid State Microstructures, Nanjing Univ., Nanjing, China
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
3
Abstract :
Si nanocrystals (Si-NCs) sandwiched by amorphous silicon carbide (a-SiC) were fabricated using KrF excimer laser crystallization technique. Charge injection into Si-NCs in a microscopic area was realized in an atomic force microscopy (AFM) system and the charging effect was subsequently studied in situ by electrostatic force microscopy (EFM) and Kelvin probe force microscopy (KPFM). Numerical calculations based on electric field analysis in both EFM and KPFM measurements were carried out to extract the areal charge densities and the results are compatible with each other. Finally, the advantages and disadvantages of the two scanning probe techniques are discussed.
Keywords :
atomic force microscopy; crystallisation; dielectric materials; elemental semiconductors; nanostructured materials; semiconductor-insulator boundaries; silicon; silicon compounds; AFM; EFM; KPFM; Kelvin probe force microscopy; KrF excimer laser crystallization technique; Si; SiC-Si-SiC-Si; amorphous silicon carbide; areal charge densities; atomic force microscopy; charge injection; charging effect; electric field analysis; electrostatic force microscopy; microscopic; scanning probe techniques; silicon nanocrystals; Atomic force microscopy; Charge carrier processes; Electrostatics; Force; Silicon; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021175
Filename :
7021175
Link To Document :
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