Title :
The threshold voltages of low temperature polycrystalline silicon thin film transistors
Author :
Mingxiang Wang ; Jieyun Zhou ; Xiaoliang Zhou
Author_Institution :
Dept. of Microelectron., Soochow Univ., Suzhou, China
Abstract :
Carriers transport and channel turn-on in low temperature polycrystalline silicon (LTPS) thin-film transistors (TFTs) are different from that in MOSFETs. Physical meanings of several key threshold voltages for the channel inversion and turn-on are clarified. Channel inversion starts from the partial inversion of the Si grains at Vg = Vinv_i, and ends with the full inversion of all Si grains at Vg = Vinv_f. However, the channel turn-on voltage VON is still larger, which includes the channel inversion voltage Vinv, as well as required gate voltage to lower the grain boundary (GB) potential barrier height (qφb) to the level of 3kT. Drift current dominates both the ON-state and the subthreshold regions of TFTs. Carriers thermionic emission over GB barrier is the controlling transport mechanism, however, before the channel turn-on the carrier effective mobility of LTPS TFTs follows the Meyer-Neldel rule.
Keywords :
carrier mobility; elemental semiconductors; silicon; thermionic emission; thin film transistors; LTPS thin-film transistors; Meyer-Neldel rule; Si; carrier effective mobility; channel inversion voltage; grain boundary potential barrier height; low temperature polycrystalline silicon TFT; silicon grains; thermionic emission; threshold voltage; transport mechanism; Abstracts; MOSFET; Semiconductor device modeling; Thin film transistors;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
DOI :
10.1109/ICSICT.2014.7021180