DocumentCode :
241527
Title :
Properties of Al-doped ZnO film transistors with different source and drain electrodes
Author :
Cheng Zhang ; Dan Xie ; Jianlong Xu ; Gang Li ; Xiaowen Zhang ; Yilin Sun ; Yuanfan Zhao ; Tingting Feng ; Tianling Ren
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
3
Abstract :
We report the influences of Al doping and source/drain electrodes on the electrical performances of ZnO thin film transistors (TFTs).The electron mobility of Al-doped ZnO (AZO) films increases by two orders of magnitude with 1% Al doping, thus improving the performances of ZnO TFTs. TFTs with Ti/Pt source/drain electrodes exhibit better saturation and ON/OFF properties than that with Al electrodes, however, its drain current is relatively lower due to the Schottky structure formed between Pt/Ti and AZO layers.
Keywords :
II-VI semiconductors; aluminium; electrodes; electron mobility; platinum; thin film transistors; zinc compounds; AZO films; Al; Al doping; Al-doped ZnO films; Schottky structure; Ti-Pt; Ti-Pt source-drain electrodes; ZnO; ZnO TFT; ZnO thin film transistors; drain current; electron mobility; Abstracts; Electrodes; Human computer interaction; Three-dimensional displays; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021184
Filename :
7021184
Link To Document :
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