DocumentCode
241583
Title
Defect engineering via surfaces for metal-oxide electronics
Author
Seebauer, Edmund G.
Author_Institution
Dept. of Chem. & Biomol. Eng., Univ. of Illinois, Urbana, IL, USA
fYear
2014
fDate
28-31 Oct. 2014
Firstpage
1
Lastpage
4
Abstract
Recent advances are presented relating to methods for engineering the behavior of point defects in oxide semiconductors like rutile TiO2 and ZnO. Self-diffusion experiments, supported by continuum computations, show that surfaces exert profound effects on defects within the bulk through two distinct mechanisms involving surface chemical bond exchange and electrostatics. Such effects are especially pronounced in confined geometries such as thin films, small particles and nanowires with high surface/volume ratios.
Keywords
point defects; self-diffusion; surface treatment; TiO2; ZnO; continuum computations; defect engineering; metal oxide electronics; oxide semiconductors; point defects; self-diffusion experiments; surface defect; Abstracts; Heating;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location
Guilin
Print_ISBN
978-1-4799-3296-2
Type
conf
DOI
10.1109/ICSICT.2014.7021214
Filename
7021214
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