• DocumentCode
    241622
  • Title

    3D RRAM: Design and optimization

  • Author

    Jinfeng Kang ; Bin Gao ; Chen, Bing ; Huang, Pei-Yu ; Zhang, F.F. ; Deng, Y.X. ; Liu, L.F. ; Liu, X.Y. ; Chen, H.-Y. ; Jiang, Z. ; Yu, S.M. ; Wong, H.-S Philip

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • fYear
    2014
  • fDate
    28-31 Oct. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A novel vertical RRAM for 3D cross-point architecture is proposed. The design and optimization issues of the proposed vertical RRAM for 3D cross-point architecture array are addressed from both device and array levels. A double layer stacked HfOx based vertical RRAM devices with interface engineering fabricated using a cost-effective fabrication process. The excellent performances such as low reset current, fast switching speed, high switching endurance and disturbance immunity, good retention and self-selectivity are demonstrated in the fabricated HfOx based vertical RRAM devices. The opimized design guidances for the 3D cross-point architecture array are presented.
  • Keywords
    circuit optimisation; hafnium compounds; high-k dielectric thin films; integrated circuit design; random-access storage; three-dimensional integrated circuits; 3D RRAM; 3D cross-point architecture array; HfOx; cost-effective fabrication; double layer stacked HfOx based vertical RRAM devices; interface engineering; metal oxide based resistive switching random access memory; opimized design guidances; vertical RRAM; Abstracts; Arrays; Microprocessors; Performance evaluation; Switches; Three-dimensional displays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4799-3296-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2014.7021234
  • Filename
    7021234