• DocumentCode
    2416955
  • Title

    Determination of reliability on MOCVD grown InGaP/GaAs HBT´s under both thermal and current acceleration stresses

  • Author

    Feng, Kevin T. ; Rushing, Lance ; Canfield, Phil ; Flores, Larry

  • Author_Institution
    Reliability Dept., Conexant Syst. Inc., Newbury Park, CA, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    159
  • Lastpage
    180
  • Abstract
    Conexant´s reliability infrastructure was utilized to determine the reliability of next generation InGaP/GaAs heterojunction bipolar transistors (HBT´s). The investigated InGaP HBT´s were subjected to stresses at three junction temperatures and three current densities, in order to extract both thermal and current acceleration factors. The primary failure mode we identified for all stress conditions is sudden Beta degradation characterized by an increase of base current over time. The thermal activation energy was extracted to be 0.97 eV for Beta degradation. The current acceleration of transistor lifetime is modeled as a power law relationship and we have extracted a square root dependence of lifetime on current density.
  • Keywords
    III-V semiconductors; MOCVD coatings; failure analysis; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor device reliability; InGaP-GaAs; InGaP/GaAs heterojunction bipolar transistor; MOCVD growth; beta degradation; current acceleration stress; current density; device lifetime; failure mode; junction temperature; reliability; thermal acceleration stress; thermal activation energy; Acceleration; Current density; Gallium arsenide; Heterojunction bipolar transistors; Life testing; MOCVD; Packaging; Temperature; Thermal degradation; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    GaAs Reliability Workshop, 2001. Proceedings
  • Print_ISBN
    0-7908-0066-7
  • Type

    conf

  • DOI
    10.1109/GAASRW.2001.995743
  • Filename
    995743