DocumentCode
2416955
Title
Determination of reliability on MOCVD grown InGaP/GaAs HBT´s under both thermal and current acceleration stresses
Author
Feng, Kevin T. ; Rushing, Lance ; Canfield, Phil ; Flores, Larry
Author_Institution
Reliability Dept., Conexant Syst. Inc., Newbury Park, CA, USA
fYear
2001
fDate
2001
Firstpage
159
Lastpage
180
Abstract
Conexant´s reliability infrastructure was utilized to determine the reliability of next generation InGaP/GaAs heterojunction bipolar transistors (HBT´s). The investigated InGaP HBT´s were subjected to stresses at three junction temperatures and three current densities, in order to extract both thermal and current acceleration factors. The primary failure mode we identified for all stress conditions is sudden Beta degradation characterized by an increase of base current over time. The thermal activation energy was extracted to be 0.97 eV for Beta degradation. The current acceleration of transistor lifetime is modeled as a power law relationship and we have extracted a square root dependence of lifetime on current density.
Keywords
III-V semiconductors; MOCVD coatings; failure analysis; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor device reliability; InGaP-GaAs; InGaP/GaAs heterojunction bipolar transistor; MOCVD growth; beta degradation; current acceleration stress; current density; device lifetime; failure mode; junction temperature; reliability; thermal acceleration stress; thermal activation energy; Acceleration; Current density; Gallium arsenide; Heterojunction bipolar transistors; Life testing; MOCVD; Packaging; Temperature; Thermal degradation; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
GaAs Reliability Workshop, 2001. Proceedings
Print_ISBN
0-7908-0066-7
Type
conf
DOI
10.1109/GAASRW.2001.995743
Filename
995743
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