DocumentCode :
241794
Title :
3D RRAM design and benchmark with 3d NAND FLASH
Author :
Pai-Yu Chen ; Cong Xu ; Yuan Xie ; Shimeng Yu
Author_Institution :
Arizona State Univ., Tempe, AZ, USA
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
4
Abstract :
The monolithic 3D integration of resistive switching random access memory (RRAM) is one attractive approach to build high-density non-volatile memory. In this paper, the design considerations of 3D vertical RRAM architecture are presented from the device, circuit to system level. Due to the voltage drop and sneak path problem, the sub-array size of the 3D NAND is still limited as compared with that of the 3D NAND. To be cost-competitive with the 3D NAND, high on-state resistance, high I-V nonlinearity and low interconnect resistivity is required to enable Mb 3D RRAM sub-array. Although the 3D RRAM has disadvantage in array efficiency (consequently in cost per bit) than the 3D NAND, the 3D RRAM outperforms the 3D NAND in throughput performance at system-level.
Keywords :
flash memories; integrated circuit design; resistive RAM; three-dimensional integrated circuits; 3D NAND flash memory; 3D RRAM design; 3D vertical RRAM architecture; monolithic 3D integration; resistive switching random access memory; Abstracts; Arrays; Nonvolatile memory; Reliability engineering; Tin; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021320
Filename :
7021320
Link To Document :
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