DocumentCode
241897
Title
Investigation of charge loss mechanisms IN 3D TANOS cylindrical junction-less charge trapping memory
Author
Xinkai Li ; Zongliang Huo ; Lei Jin ; Yan Wang ; Jing Liu ; Dandan Jiang ; Xiaonan Yang ; Ming Liu
Author_Institution
Inst. of Microelectron., Beijing, China
fYear
2014
fDate
28-31 Oct. 2014
Firstpage
1
Lastpage
3
Abstract
This paper presents a detailed simulation analysis of the charge loss mechanisms in 3D TANOS cylindrical junction-less charge trapping memory devices. For the programmed state, the role of tunneling through the bottom oxide and top oxide in vertical charge loss were compared, and the latter is found to be the dominant component. It is also found that lateral charge migration shows dependence on the shape of charge trapping layer. And the winding charge trapping layer shows favorable lateral migration performance. Simulation results show that lateral charge migration is more severe rather than vertical charge loss and must be focused with decreasing memory cell size. The result will give an guidance for high density 3D memory design optimization.
Keywords
NAND circuits; flash memories; optimisation; 3D TANOS; 3D memory design optimization; bottom oxide; charge loss mechanisms; charge trapping layer; charge trapping memory; cylindrical junctionless CTM; lateral charge migration; lateral migration performance; top oxide; vertical charge loss; Abstracts; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location
Guilin
Print_ISBN
978-1-4799-3296-2
Type
conf
DOI
10.1109/ICSICT.2014.7021373
Filename
7021373
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