Title :
Fabrication of 3-D submicron glass structures by FIB
Author :
Chao, C.H. ; Pan, C.T. ; Wu, J.R.
Author_Institution :
Dept. of Mech. & Electro-Mech. Eng., National Sun Yat-Sen Univ., Kaoshiung
Abstract :
The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high sensitivity, high material removal rates, low forward scattering and direct fabrication in selective area without any etching mask, etc. In this study, FIB etched Pyrex glass was used for fast fabrication of 3D submicron structures. A high aspect-ratio (HAR) glass structure of 5 (1.97mum depth/0.39 mum width) was fabricated. The experimental results in terms of limiting beam size, ion dose (ion/cm2), beam current, etc. was discussed. The influence of XeF2 gas on FIB glass fabrication was investigated.
Keywords :
focused ion beam technology; glass; sputter etching; 0.39 micron; 1.97 micron; 3D submicron glass; FIB; Pyrex glass; focused ion beam; high aspect-ratio glass structure; Biological materials; Biomedical optical imaging; Etching; Fabrication; Glass; Ion beams; Optical materials; Optical scattering; Optical sensors; Silicon;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2007. NEMS '07. 2nd IEEE International Conference on
Conference_Location :
Bangkok
Print_ISBN :
1-4244-0610-2
DOI :
10.1109/NEMS.2007.352088
