Fabrication of Nano Channels Using IBE for Nanofluidics Study

This paper presents a novel approach based on the angle selectivity of ion-beam etching to fabricate nano channel. The relation between the incident angle of ion beam etching and obtained profile has been carefully investigated. Starting from micro scale features, the authors formed desired self-aligned nano scale etching windows by using specially processes. Along with other MEMS processes, nano channel arrays with double-etched triangular side-regions have been successfully developed, and a width as small as 200nm was achieved. This novel approach demonstrates its potential application in nano fluidic field.