• DocumentCode
    2421452
  • Title

    An investigation of response surfaces among process, device and circuit using analytical model

  • Author

    Shigyo, Naoyuki

  • Author_Institution
    Syst. LSI Design Div., Toshiba Corp., Yokohama, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    11
  • Lastpage
    14
  • Abstract
    This article analyzes the process-to-device and device-to-circuit response surfaces using an analytical model to investigate the definition of the worst-case circuit models. It is found that the worst-cases for L, tox and Nchn corresponded to those for the propagation delay τpd of a ring oscillator
  • Keywords
    integrated circuit modelling; oscillators; semiconductor device models; semiconductor process modelling; analytical model; circuit model; device model; device-circuit response surfaces; process model; process-device response surfaces; propagation delay; response surfaces; ring oscillator; worst-case circuit models; Analytical models; Circuits; Economic indicators; Fluctuations; Large scale integration; Probability distribution; Propagation delay; Response surface methodology; Ring oscillators; Tail;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Statistical Metrology, 2000 5th International Workshop on
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    0-7803-5896-1
  • Type

    conf

  • DOI
    10.1109/IWSTM.2000.869300
  • Filename
    869300
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2421452