DocumentCode :
2421568
Title :
Statistical BSIM3 model parameter extraction and fast/slow model parameter determination for high speed SRAM parametric yield estimation
Author :
Miyama, Mikako ; Kamohara, Shiro ; Nakura, Koicchi ; Shinozaki, Mizuki ; Akioka, Takeshi ; Okuyama, K. ; Kubota, K.
Author_Institution :
Production Eng. Res. Lab., Hitachi Ltd., Tokyo, Japan
fYear :
2000
fDate :
2000
Firstpage :
42
Lastpage :
45
Abstract :
To achieve high yield without degrading performance, it is important to consider process variations during circuit designing. There is also a strong need of good model parameters for fast/slow cases, which represent the performance variations. We have developed a statistical model parameter extraction method, to extract sets of process related BSIM3 parameters from in-line measurement data such as drain saturation current and threshold voltage. This extraction method is based on our pre-silicon parameter generation methodology, which makes the model parameter predictable when changing some parameters related to the process. We have also proposed a method to determine the fast/slow model parameters using the statistical model parameters, for circuit designing. We have applied this method to a 0.20 μm process SRAM test chip, and have obtained good results comparing to measurement, thus making it possible to estimate parametric yield by simulation
Keywords :
SRAM chips; integrated circuit design; integrated circuit modelling; integrated circuit testing; integrated circuit yield; statistical analysis; 0.20 mum; SRAM test chip; circuit design; drain saturation current; extraction method; fast/slow model parameter determination; high speed SRAM parametric yield estimation; high yield; in-line measurement; parametric yield; pre-silicon parameter generation methodology; process related BSIM3 parameters; process variations; simulation; statistical BSIM3 model parameter extraction; statistical model parameter extraction method; threshold voltage; Circuit testing; Current measurement; Data mining; Degradation; Parameter extraction; Predictive models; Random access memory; Semiconductor device measurement; Threshold voltage; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Statistical Metrology, 2000 5th International Workshop on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5896-1
Type :
conf
DOI :
10.1109/IWSTM.2000.869309
Filename :
869309
Link To Document :
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