Title :
Analysis of impedance matching control
Author :
Hirose, Yuuki ; Kawamura, Atsuo ; Takayanagi, Atsushi ; Takada, Hirokazu
Author_Institution :
Div. of Electr. & Comput. Eng., Yokohama Nat. Univ., Yokohama, Japan
Abstract :
This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 Omega. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 Omega. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.
Keywords :
impedance matching; plasma applications; power supplies to apparatus; LC circuit; impedance matching; impedance matching control; plasma chamber; plasma processing; radio frequency electricity; resistance 50 ohm; Capacitance; Capacitors; Circuit stability; Computer aided manufacturing; Impedance matching; Plasma displays; Plasma materials processing; Plasma stability; Radio control; Radio frequency;
Conference_Titel :
Power Electronics and Motion Control Conference, 2009. IPEMC '09. IEEE 6th International
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-3556-2
Electronic_ISBN :
978-1-4244-3557-9
DOI :
10.1109/IPEMC.2009.5157563
